INDEOTEC SA successfully passed heterojunction process acceptance tests for several OCTOPUS deposition systems
Neuchâtel – INDEOtec SA (Switzerland) reports the successful completion of system acceptance tests for two of its customers, namely King Abdullah University of Science and Technology (KAUST) in Saudi Arabia, and Fraunhofer ISE in Freiburg, Germany.
The acceptance test milestones have been completed for both projects well in time; the comprehensive and partly challenging process parameter tests for the heterojunction device generation have been passed successfully and surpassed the expectations especially for the intrinsic and doped a-Si:H layers. “Our team is excited about the process results and the system quality.
We are now really looking forward to do our research work with the new tool.”, states Jochen Rentsch, Head of Department „PV Production Technology“ at Fraunhofer ISE.
“For our research team here in Saudi Arabia the high system quality and the timely, on-the-spot process qualification is indeed convincing and confirmed the capabilities of INDEOtec.”, commented Prof. Stefaan de Wolf from KAUST.
For both projects the joint deposition of all layers per each wafer side in the same reactor repeatedly proved the functionality of the concept of the Anti-Cross-Contamination-Treatment (ACCT) for the HIT device production.
This treatment, together with the patented Mirror Reactor concept – which avoids the flipping between the top and bottom wafer deposition – provides the baseline for the exceptional high throughput levels and an extremely low footprint of Indeotec’s upcoming OCTOPUS III mass production tool.
“Our PECVD process proved its robustness and provides highly reproducible results at all systems sold meanwhile, something which our team is very proud of. We have seen efficiency levels well above 22% for 6” cells to be achievable with these recipes” states Dr. Omid Shojaei, CEO of Indeotec.
INDEOtec SA (www.indeotec.com) is a highly innovative thin film deposition equipment manufacturer, located in Neuchâtel (Switzerland). With its OCTOPUS platform the company offers a modular and fully automated cluster deposition system for the deposition of various singular or multiple stacks of thin films by means of PECVD or PVD. The OCTOPUS system significantly reduces the substrate handling and avoids vacuum breakage between top and bottom side deposition cycles.